A silver film capable of achieving highly reliable chip-level interconnections, requiring no printing or baking during the production process, significantly enhancing operational convenience and production efficiency. This product is particularly suitable for packaging applications involving large-sized chip structures. After sintering, it forms a highly thermally conductive layer between the chip and the substrate, greatly improving the thermal management and reliability of device packaging.
Parameter | Details Value |
Thermal Conductivity (W/m⸱K) | ≥200 |
Volumetric Resistivity (μΩ.cm) | ≤4.0 |
Viscosity (Pa.s) | NA |
Mounting Technology | Thermo-compress Die Laminating/Die Placement |
Applicable Interface | Au、Ag |
Sintering Atmosphere | Air、Vacuum、N₂ |
Sintering Temperature (℃) | 230 |
Sintering Pressure (MPa) | 15 |
Sintering Time (min) | 5 |
Shearing Strength (MPa) | ≥80 |